Gas diffuser plate assembly and RF electrode

Details Gas diffuser plate assembly and RF electrode Gas diffuser plate assembly and RF electrode

1995-05-30

1999-06-01

Dutton, Brian

Coating apparatus

Gas or vapor deposition

With treating means

118723I, C23C 1600

Patent

active

059085088

ABSTRACT:
The apparatus includes a gas diffuser plate having an integral heat pipe for accurately controlling the temperature of the diffuser plate during CVD processing to prevent unwanted tungsten (or other material) deposition on the diffuser plate. The apparatus is also useful as an RF plasma cleaning device in which the diffuser plate acts as an RF electrode, the heat pipe tube acts as an RF input lead, and the apparatus further includes a connector to an RF power source. Additionally, in combination, the heat pipe-cooled gas diffuser plate and RF electrode may be used advantageously in plasma enhanced chemical vapor deposition (PECVD).

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What is a Heat Pipe? Brochure of Noren.

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