Gas delivery systems for particle beam processing

Details Gas delivery systems for particle beam processing Gas delivery systems for particle beam processing

1996-06-19

1998-12-22

Nuzzolillo, M.

Etching a substrate: processes

Nongaseous phase etching of substrate

Projecting etchant against a moving substrate or controlling...

216 83, 156345, C03C 2506

Patent

active

058514139

ABSTRACT:
Apparatus and method of an improved gas delivery system for delivering reactant material to a workpiece, such as a substrate, being operated on by a particle beam employs a shroud-type concentrator having an interior axial passage. Fluid reactant material is supplied to the axial passage for delivery to the workpiece. A particle beam can traverse the axial passage for impingement on the workpiece surface, concurrently if desired with the reactant delivery.

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