Gas control system for chemical vapor deposition system

Heating – Work chamber having heating means – Means supplying a protective or treating agent other than or...

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118715, 118724, 427 85, 432 55, F27B 504, F27D 1900, B05C 1902

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043690319

ABSTRACT:
A gas flow control system in which several constituent gases are mixed and the mixture delivered through controlled injectors to a processing zone. Mass flow controllers control the injector flows with one of the controllers being a master and the other being slaved to provide a selected percentage of the flow through the master controller. The gas mix is regulated by a mass flow controller on one of the constituents and a flow meter on the other, the flow meter producing an error signal which is used to readjust the total flow through the injectors by control of the master injector flow controller.

REFERENCES:
patent: 3396955 (1968-08-01), Martinek
patent: 3917238 (1975-11-01), Gohring
patent: 4098923 (1978-07-01), Alberti et al.
patent: 4100310 (1978-07-01), Ura et al.
patent: 4138306 (1979-02-01), Niwa
patent: 4217375 (1980-08-01), Adams

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