Gas cluster ion beam emitting apparatus and method for...

Details Gas cluster ion beam emitting apparatus and method for... Gas cluster ion beam emitting apparatus and method for...

2008-03-07

2010-12-21

Berman, Jack I (Department: 2881)

Radiant energy

Ion generation

Electron bombardment type

C250S42300F, C250S492210, C250S492100, C355S033000, C315S111810, C118S72300R, C438S710000

Reexamination Certificate

active

07855374

ABSTRACT:
An emitting apparatus50has a gas cluster generation chamber2and a nozzle3as means for generating a gas cluster and emitting the gas cluster to a processing object10. A group of gas clusters jetted from the nozzle3is shaped into a gas cluster stream8in a beam form when passing through a skimmer4. Electrons are emitted from an electron gun12to the gas cluster stream8, whereby the gas cluster in the gas cluster stream is ionized.

REFERENCES:
patent: 3999072 (1976-12-01), Takagi
patent: 4076993 (1978-02-01), Nowak
patent: 5354445 (1994-10-01), Ito et al.
patent: 5527731 (1996-06-01), Yamamoto et al.
patent: 6797339 (2004-09-01), Akizuki et al.
patent: 7365341 (2008-04-01), Saito et al.
patent: 2002/0015803 (2002-02-01), Akizuki et al.
patent: 2002/0162508 (2002-11-01), Dykstra
patent: 60-200448 (1985-10-01), None
patent: 61-157676 (1986-07-01), None
patent: S63-013250 (1988-01-01), None
patent: 04-289161 (1992-10-01), None
patent: 08-120470 (1996-05-01), None
patent: 08-127867 (1996-05-01), None
patent: 09-041122 (1997-02-01), None
Translation of Japanese Office Action dated Apr. 22, 2009.

Affiliated with

Also associated with

Rating

Gas cluster ion beam emitting apparatus and method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas cluster ion beam emitting apparatus and method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas cluster ion beam emitting apparatus and method for... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4229566