Fluid handling – With cleaner – lubrication added to fluid or liquid sealing... – Cleaning or steam sterilizing
Reexamination Certificate
2005-09-06
2005-09-06
Walton, George L. (Department: 3753)
Fluid handling
With cleaner, lubrication added to fluid or liquid sealing...
Cleaning or steam sterilizing
C118S715000, C134S001100, C134S001200, C134S001300, C134S022100, C134S022110, C137S012000, C137S014000, C137S015040, C137S238000, C137S341000, C137S563000, C137S565230, C137S565300, C156S345260, C156S345290, C156S345330, C156S345370, C438S905000, C438S906000
Reexamination Certificate
active
06938638
ABSTRACT:
A gas-circulating processing apparatus which comprises a processing chamber, a gas feeding piping, a gas supply piping, a first exhaust mechanism discharging a gas from the processing chamber, a second exhaust mechanism discharging a portion of a gas discharged from the first exhaust mechanism, a back pressure adjusting mechanism interposed between the first exhaust mechanism and the second exhaust mechanism to adjust a back pressure of the first exhaust mechanism, and a gas circulating piping which is configured to combine another portion of the gas that has been discharged from the first exhaust mechanism with a processing gas supplied from the gas supply piping, wherein the gas feeding piping has a larger inner diameter than that of the gas supply, or the processing gas is introduced into the first exhaust mechanism, or a first heater is provided to heat at least part of the circulating route.
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Itsuko Sakai et al., “Semiconductor Processing Apparatus and Method for Manufacturing a Semiconductor Device”, U.S. Appl. No. 09/955,083, filed Sep. 19, 2001.
Masashi Saito et al., “Processing Apparatus”, U.S. Appl. No. 09/686,370, filed Oct. 12, 2000.
Kaji Naruhiko
Kubota Hiroshi
Nakata Rempei
Sakai Itsuko
Yoda Takashi
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Walton George L.
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