Gas charging system for fill of gas storage and dispensing...

Refrigeration – Low pressure cold trap process and apparatus

Reexamination Certificate

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C062S048100

Reexamination Certificate

active

06907740

ABSTRACT:
An apparatus and method for charging a gas storage and dispensing vessel with gas to a predetermined pressure level, e.g., a gas to be employed in a semiconductor manufacturing operation such as a hydride, halide or organometallic reagent gas. In the gas charging, a source gas is liquefied, e.g., in a cryotrap, and then gasified in closed flow communication with the vessel to introduce the gas thereinto, and such liquefaction/gasification steps are carried out alternatively and repetitively, to charge the vessel in a step-wise, progressive fashion with gas, until a full fill state is achieved, with the contained gas at the predetermined pressure level.

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patent: 2003/0010040 (2003-01-01), Torres et al.

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