Gas agitated liquid etcher

Details Gas agitated liquid etcher Gas agitated liquid etcher

1996-10-03

1998-12-08

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

216 90, 438747, H01L 2100

Patent

active

058463747

ABSTRACT:
A liquid etch apparatus including an outer tank for holding a liquid etch solution, which has included therein an inner cylindrical member positioned in the outer tank. At one end of the inner cylindrical member, a sparger or other gas supply means may be provided. Filters are provided between the inner cylindrical member and the outer tank. Substrates are secured in the inner tank and a propeller is provided below the substrates. Gas is introduced into the inner cylindrical member during the etch process which creates a pressure gradient between the inner tank and the outer tank, forcing particulate matter carried by the gaseous particles to circulate around to the filters.

REFERENCES:
patent: 4251317 (1981-02-01), Foote
patent: 4302273 (1981-11-01), Howard
patent: 4675067 (1987-06-01), Valley
patent: 4840701 (1989-06-01), Stern
Chapter Nine, "Agitation and Mixing of Liquids," Unit Operations of Chemical Engineering, McCabe and Thiele, Wiley Press.
Wet Chemical Wafer Cleaning, Lecture notes of Werner Kern, Semiconductor Wafer Cleaning Technology (2-day course), Sep. 23-24, 1991.

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