Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1993-08-12
1995-05-02
Yusko, Donald J.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041801, 345107, 313483, C25D 112
Patent
active
054116562
ABSTRACT:
An electrophoretic suspension prepared in accordance with the present invention comprises a dielectric fluid having suspended therein a plurality of pigment particles movable between the electrodes of an EPID device in response to an electric potential applied thereto and an effective amount of at least one additive for chemically absorbing at least one gas in the fluid. To absorb hydrogen gas in the dielectric fluid, a hydrogen absorbing additive is dispersed therein. The molecule of the hydrogen absorbing additive has an aromatic C/H ratio of 1/0.8 or less, and preferably between 1/0.67 and 1/0.75. To absorb chlorine gas in the dielectric fluid, an effective amount of an chlorine gas absorbing compound is also preferably added thereto. The chlorine gas absorbing additive comprises a molecule having at least one double bond and may be a sterically strained alkene such 5-ethylidene-2-norbornene.
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Copytele Inc.
Patel Nimesh D.
Plevy Arthur L.
Yusko Donald J.
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