Gas abatement

Details Gas abatement Gas abatement

2005-08-02

2009-02-24

Vanoy, Timothy C (Department: 1793)

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

C423S237000, C423S24000R, C423S241000, C423S245100, C423S245300, C431S002000, C431S005000, C422S111000, C422S168000, C422S182000, C422S183000, C110S186000

Reexamination Certificate

active

07494633

ABSTRACT:
Apparatus is described for treating an effluent fluid stream from a semiconductor manufacturing process tool. The apparatus comprises a combustion chamber, means for heating the combustion chamber, and a nozzle for injecting the effluent stream into the combustion chamber. The apparatus is configured to enable a fuel and an oxidant to be selectively injected into the effluent stream as required to optimise the combustion conditions for a particular effluent stream. In one to embodiment, a lance projecting into the nozzle selectively injects an oxidant into the effluent stream, and a sleeve surrounding the nozzle selectively injects a fuel into the effluent stream.

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