Gap measuring device and method using frustrated internal reflec

Radiant energy – Photocells; circuits and apparatus – Optical or pre-photocell system

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

359222, 356375, G01N 2186

Patent

active

052256901

ABSTRACT:
A narrow gap or unevenness of a surface of a specimen is measured by utilizing the tunnel effect of a light wave reflected at a boundary plane on the condition of total reflection. A laser beam emitted from a laser source is reflected at a surface of a prism on the condition of total reflection in terms of geometrical optics. If a gap between the surface of the prism and the specimen is about the wavelength of the laser beam, part of the laser beam is transmitted into the specimen, and the intensity of the transmitted beam depends on the gap width. A portion of the laser beam is reflected at the boundary plane back into the prism. Therefore, the gap can be measured by measuring the transmittance of the laser beam and comparing the same with the calculated relation between the transmittance and the gap calculated in advance. In practice, the gap width is determined by measuring intensity of the reflected laser beam in the presence of the gap and comparing it to the intensity of the reflected laser beam in the absence of the gap, i.e, when the specimen surface is more than several wavelengths away from the reflecting surface.

REFERENCES:
patent: 4083254 (1978-04-01), Nissl
patent: 4322979 (1982-04-01), Fromm
patent: 4490618 (1984-12-01), Cielo
patent: 4681451 (1987-07-01), Guerra et al.
patent: 5125740 (1992-06-01), Sato et al.
J. Appl. Phys.; Durig et al., vol. 59, No. 10, May 15, 1986 "Near Field Optical Scanning Microscopy" pp. 3318-3327.
Patent Abstracts of Japan; vol. 11, No. 334, (p. 631) Oct. 31, 1987 & JP A 62 116 204 (Netto Electric Company Ltd. May 27, 1987 *abstract*.
Emil Kamineniecki, J. Appl. Phis. vol. 54, No. 11, pp. 6481-6487, Nov. 1983 Model SCA-H Surface Charge Analyzer Brochure by Semi-Test.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Gap measuring device and method using frustrated internal reflec does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gap measuring device and method using frustrated internal reflec, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gap measuring device and method using frustrated internal reflec will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1692035

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.