Gap measuring apparatus using interference fringes of reflected

Details Gap measuring apparatus using interference fringes of reflected Gap measuring apparatus using interference fringes of reflected

1987-07-31

1990-06-12

McGraw, Vincent P.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356355, G01B 902

Patent

active

049327810

ABSTRACT:
A proximity gap measuring system usable in a proximity mask aligner. The measuring system includes an illumination optical system for illuminating a mask and a wafer with white light, and an optical system, including a Wollaston prism, for dividing a wavefront of each of the light beams reflected from the mask and the wafer and causing relative inclination between the divided wavefronts to form a white light fringe on the Wollaston prism. Between the Wollaston prism and the mask or wafer, there is an anamorphic imaging system for forming an image of each of the mask and wafer on the Wollaston prism.

REFERENCES:
patent: 2466322 (1949-04-01), Merritt
patent: 2595923 (1961-08-01), Ubbelohde et al.
patent: 3402978 (1968-09-01), Offner
patent: 4072422 (1978-02-01), Tanaka et al.
patent: 4105335 (1978-08-01), Tanaka et al.

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