Gap gauge

Details Gap gauge Gap gauge

2005-08-30

2005-08-30

Fulton, Christopher W. (Department: 2859)

Geometrical instruments

Gauge

Internal

C033S501450, C033S567000

Reexamination Certificate

active

06935038

ABSTRACT:
An apparatus and method for preventing damage to a chamber wall by a baffle plate in a semiconductor fabrication system during a semiconductor fabrication operation is disclosed herein. An electrostatic chuck is associated with the semiconductor fabrication system. A gauge for measuring a gap between said baffle plate and the chamber wall can be utilized to prevent damage to the chamber wall by the baffle plate during a movement of the electrostatic chunk during the semiconductor fabrication operation. Such a semiconductor fabrication operation can comprise, for example, a wet cleaning semiconductor operation.

REFERENCES:
patent: 5444921 (1995-08-01), Milina
patent: 6323494 (2001-11-01), Lee
patent: 6359677 (2002-03-01), Itoh et al.
patent: 6446581 (2002-09-01), Carbone et al.
patent: 6468816 (2002-10-01), Hunter

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