Semiconductor device manufacturing: process – Forming bipolar transistor by formation or alteration of... – Permeable or metal base
Reissue Patent
2004-10-01
2011-11-22
Smith, Matthew (Department: 2823)
Semiconductor device manufacturing: process
Forming bipolar transistor by formation or alteration of...
Permeable or metal base
C438S172000, C438S342000, C438S718000, C438S173000, C257SE21246, C257SE21402, C257SE21220
Reissue Patent
active
RE042955
ABSTRACT:
An etched grooved GaN-based permeable-base transistor structure is disclosed, along with a method for fabrication of same.
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Bellotti Enrico
Chu Kanin
Eddy, Jr. Charles R.
Gunter Liberty L.
Moustakas Theodore D.
BAE Systems Information and Electronic Systems Integration Inc.
Cernota Andrew Paul
Jefferson Quovaunda
Smith Matthew
Vern Maine & Associates
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