Semiconductor device manufacturing: process – Forming bipolar transistor by formation or alteration of... – Permeable or metal base
Reexamination Certificate
2004-10-01
2008-08-19
Toledo, Fernando L. (Department: 2823)
Semiconductor device manufacturing: process
Forming bipolar transistor by formation or alteration of...
Permeable or metal base
C438S172000, C438S173000, C438S342000, C438S718000, C257SE21220, C257SE21246, C257SE21402
Reexamination Certificate
active
07413958
ABSTRACT:
An etched grooved GaN-based permeable-base transistor structure is disclosed, along with a method for fabrication of same.
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Bellotti Enrico
Chu Kanin
Eddy, Jr. Charles R
Gunter Liberty L
Moustakas Theodore D
BAE Systems Information and Electronic Systems Integration Inc.
Jefferson Quovaunda
Toledo Fernando L.
Vern Maine & Associates
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