GaN-based high electron mobility transistor (HEMT) with an...

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor

Reexamination Certificate

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C257S282000, C257S283000, C257SE21621, C257SE21624, C257SE29246

Reexamination Certificate

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08044433

ABSTRACT:
A semiconductor device includes a substrate, a GaN-based semiconductor layer formed on the substrate, a gate electrode embedded in the GaN-based semiconductor layer, a source electrode and a drain electrode formed on both sides of the gate electrode, a first recess portion formed between the gate electrode and the source electrode, and a second recess portion formed between the gate electrode and the drain electrode. The first recess portion has a depth deeper than that of the second recess portion.

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patent: 6133593 (2000-10-01), Boos et al.
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patent: 6294801 (2001-09-01), Inokuchi et al.
patent: 6492669 (2002-12-01), Nakayama et al.
patent: 6639255 (2003-10-01), Inoue et al.
patent: 6787820 (2004-09-01), Inoue et al.
patent: 2002-016245 (2002-01-01), None

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