Galvanic primary element

Chemistry: electrical current producing apparatus – product – and – Fluid active material or two-fluid electrolyte combination...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

429105, H01M 1202

Patent

active

043638554

ABSTRACT:
A galvanic primary element of the system Li/H.sub.2 O.sub.2 comprises a gas diffusion electrode which separates the lithium electrode from the cathode space which is filled with aqueous H.sub.2 O.sub.2 solution. In the working layer which is flanked by capillary active cover layers of the gas diffusion electrode, automatically drawn-in H.sub.2 O.sub.2 is decomposed into H.sub.2 O.sub.2 and O.sub.2 catalytically until the gas pressure is in equilibrium with capillary forces and thereby interrupts the access of additional H.sub.2 O.sub.2 solution to the working layer. Short circuiting of the cell or connection of a load causes a reduction of the gas pressure due to electrochemical reaction of the O.sub.2 with the lithium so that fresh reactant solution can flow in. A reaction regime matching the current draw becomes possible because of the property of polyurethane to gel in aqueous H.sub.2 O.sub.2 by virtue of the fact that the H.sub.2 O.sub.2 is slowly pressed out of the gel as out of a sponge by means of a ram toward the gas diffusion electrode.

REFERENCES:
patent: 3201282 (1965-08-01), Justi et al.
patent: 3284238 (1966-11-01), White
patent: 3446671 (1969-05-01), Kring
patent: 3758339 (1973-09-01), Marion
patent: 4057675 (1977-11-01), Halberstadt et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Galvanic primary element does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Galvanic primary element, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Galvanic primary element will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1201635

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.