Galvanic dispersion deposition bath

Details Galvanic dispersion deposition bath Galvanic dispersion deposition bath

1984-03-23

1984-10-30

Tufariello, Thomas

Chemistry: electrical and wave energy

Processes and products

204DIG2, C25D 1500

Patent

active

044798555

ABSTRACT:
A bath or electrolyte for the galvanic deposition of a metal matrix layer having embedded therein particles of a non-metallic substance, comprises a stabilizer for keeping such non-metallic substances uniformly suspended in the bath for the duration of the electrolysis. The suspension stabilizer is a cation active imidazole derivative satisfying the general formula ##STR1## wherein R.sup.1 is preferably a monovalent, saturated or unsaturated hydrocarbon radical having at least four aliphatically bound C-atoms, R.sup.2 is a methylene (carbene), or ethylene, or propylene or isopropylene group, and wherein X is selected from --NH.sub.2, --NHR.sup.3, --NR.sup.3 R.sup.4, --OH, or OR.sup.5, whereby R.sup.3, R.sup.4 and R.sup.5 are methyl, ethyl, or propyl or polyglycolether radicals having up to five --O--CH.sub.2 --CH.sub.2 groups.

REFERENCES:
patent: 3844910 (1974-10-01), Lipp
patent: 3891542 (1975-06-01), Cordone
patent: 4098654 (1978-07-01), Helle
patent: 4222828 (1980-09-01), Zuurdeeg

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