Gallium nitride crystals and wafers and method of making

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With heterojunction

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S103000

Reexamination Certificate

active

07078731

ABSTRACT:
A GaN crystal having up to about 5 mole percent of at least one of aluminum, indium, and combinations thereof. The GaN crystal has at least one grain having a diameter greater than 2 mm, a dislocation density less than about 104cm−2, and is substantially free of tilt boundaries.

REFERENCES:
patent: 5637531 (1997-06-01), Porowski et al.
patent: 5962875 (1999-10-01), Motoki et al.
patent: 6273948 (2001-08-01), Porowski et al.
patent: 6294440 (2001-09-01), Tsuda et al.
patent: 6398867 (2002-06-01), D'Evelyn et al.
patent: 6468882 (2002-10-01), Motoki et al.
patent: 6533874 (2003-03-01), Vaudo et al.
patent: 6596079 (2003-07-01), Vaudo et al.
patent: 6613143 (2003-09-01), Melnik et al.
patent: 6627552 (2003-09-01), Nishio et al.
patent: 6806508 (2004-10-01), D'Evelyn et al.
patent: 6838741 (2005-01-01), Sandvik et al.
patent: 6939488 (2005-09-01), Blomacher et al.
patent: 2002/0155634 (2002-10-01), D'Evelyn et al.
patent: 2003/0141301 (2003-07-01), D'Evelyn et al.
patent: 2004/0124435 (2004-07-01), D'Evelyn et al.
patent: 2004/0195598 (2004-10-01), Tysoe et al.
patent: 2004/0245535 (2004-12-01), D'Evelyn et al.
patent: 2005/0029537 (2005-02-01), D'Evelyn et al.
patent: 2005/0098844 (2005-05-01), Sandvik et al.
patent: 2005/0152820 (2005-07-01), D'Evelyn et al.
patent: 2005/0167692 (2005-08-01), Ishida et al.
patent: 0 937 790 (1999-08-01), None
patent: 0 966 047 (1999-12-01), None
patent: 1 172 464 (2002-01-01), None
patent: 1 249 522 (2002-10-01), None
patent: 2 796 657 (2001-01-01), None
patent: 11 171699 (1999-09-01), None
patent: 200022212 (2000-01-01), None
patent: WO 96/41906 (1996-12-01), None
patent: WO 01/24921 (2001-04-01), None
patent: WO 2004/053206 (2004-06-01), None
patent: WO 2004/053208 (2004-06-01), None
patent: WO 2005/122232 (2005-12-01), None
H. Jacobs et al., “High-Pressure Ammonolysis in Solid-State Chemistry”,Current Topics in Materials Science, vol. 8, edited by E. Kaldis, North-Holland Publishing Company, Chapter 5, pp. 383-427, 1982.
R. Dwilinski et al., “GaN synthesis by Ammonothermal Method”, Acta Physical Poloncia A.,vol. 88, No. 5, pp. 833-836, 1995.
R. Dwilinski et al., “On GaN Crystallization by Ammonothermal Method”, Acta Physica Polonica A.,vol. 90, No. 4, pp. 763-766, 1996.
Joseph W. Kolis et al., “Materials Chemistry and Bulk Crystal Growth of Group III Nitrides in Supercritical Ammonia”,Mat. Res. Soc. Symp. Proc.,vol. 495, pp. 367-372, 1998.
R. Dwilinski et al.,Ammono Method of BN, AIN and GaN Synthesis and Crystal Growth, MRS Internet Journal Nitride Semiconductor Research 3, Article 25,pp. 1-4, 1998.
R. Dwilinski et al.,Ammono Method of GaN and AIN Production,Elsevier Science, Diamond and Related Materials, vol. 7,pp. 1348-1350,1998.
J.I. Pankove et al., “Molecular Doping of Gallium Nitride”,Applied Physics Letters, vol. 74, No. 3, pp. 416-418, 1999.
S. Porowski, “Near Defect Free GaN Substrates”,MRS Internet Journal Nitride Semiconductor Research 4S1, Article G1.3, 1999.
T. Hino et al., “Characterization of Threading Dislocations in GaN Epitaxial Layers”,Applied Physics Letters, vol. 76, No. 25, American Institute of Physics, pp. 3421-3423, 2000.
Douglas R. Ketchum et al., “Crystal Growth of Gallium Nitride in Supercritical Ammonia”,Elsevier, Journal of Crystal Growth, vol. 222, pp. 431-434, 2001.
Balaji Raghothamachar et al., “Synchrotron White Beam Topography Characterization of Physical Vapor Transport Grown AIN and Ammonothermal GaN”,Elsevier, Journal of Crystal Growth, vol. 246, pp. 271-280, 2002.
S. K. Hong et al., “Evaluation of Nanopipes in MOCVD Grown(0001)GaN/AI2O3By Wet Chemical Etching”,Elsevier, Journal of Crystal Growth, vol. 191, pp. 275-278, 1998.
R. Dwilinski et al., “Exciton Photo-Luminescence of GaN Bulk Crystals Grown by the AMMONO Method”, Elsevier Science S.A., Materials Science and Engineering, vol. B50, pp. 46-49, Dec. 19, 1997.
Andrew D. Hanser et al., “Growth, Doping and Characterization of Epitaxial Thin Films and Patterned Structures of AIN, GaN, and AIxGa1-xN”, Elsevier Science S.A., Diamond and Related Materials, vol. 8, pp. 288-294, Mar. 1999.
Yu V. Melnik et al., “Structural Properties of GaN Grown on SiC Substrates by Hydride Vapor Phase Epitaxy”, Elsevier Science S.A., Diamond and Related Materials, vol. 6, pp. 11532-11535, 1997.
T. Paskova et al., “Domain Structure of Thick GaN Layers Grown by Hydride Vapor Phase Epitaxy”, MRS Internet J. Nitride Semicond. Res. 4S1, G3.16, 6 pages, 1999.
I. Grzegory et al., “GaN Crystals: Growth and Doping Under Pressure”, Mat. Res. Soc. Symp. Proc., High Pressure Research Center Polish Academy of Sciences, Warsaw, Poland, vol. 482, pp. 15-26, 1998.
T. Suski et al., “Properties of Bulk Gallium Nitride Crystals”, Electrochemical Society Proceedings, UNIPRESS, Polish Academy of Sciences, Sokolowska, Warszawa, Poland, vol. 96-11, pp. 46-57.
S. Porowski et al., “High Resistivity GaN Single Crystalline Substrates”, Proceedings of the XXVI International School of Semiconducting Compounds, Jaszowiec, Warsaw, Poland, ACTA Physica Polonica A, vol. 92, No. 5, pp. 958-962, 1997.
T. Suski et al., “High Pressure Fabrication and Processing of GaN: Mg”, UNIPRESS, High Pressure Research Center, Polish Academy of Sciences, Warszawa, Poland, Elsevier Science S.A., Materials Science and Engineering, vol. B59, pp. 1-5, 1999.
E. Frayssinet et al., “Evidence of Free Carrier Concentration Gradient Along the c-axis for Undoped GaN Single Crystals”, UNIPRESS, High Pressure Research Center, Polish Academy of Sciences, Warszawa, Poland, Elsevier Science S.A., Journal of Crystal Growth, vol. 230, pp. 442-447, 2001.
M. Lefeld-Sosnowska et al., “Extended Defects in GaN Single Crystals”, Institute of Experimental Physics, University of Warsaw, Poland, Journal of Physics D: Applied Physics, vol. 34, pp. A148-A150, 2001.
S. Krukowski, “Thermodynamics and High-Pressure Growth of (A1, Ga, In)N Single Crystals”, Elsevier Science S.A., High Research Pressure Center, Polish Academy of Sciences, Sokolowska, Warsaw, Poland, Diamond and Related Materials, vol. 6, pp. 1515-1523, 1997.
M. Leszczynski et al, “The Microstructure of Gallium Nitride Monocrystals Grown at High Pressure”, Elsevier Science S.A., High Pressure Research Center, Polish Academy of Sciences, Sokolowska, Warsaw, Poland, Journal of Crystal Growth, vol. 169, pp. 235-242, 1996.
M. Leszczynski et al, “Lattice Parameters of Gallium Nitride”, High Pressure Research Center, Polish Academy of Sciences, Sokolowska, Warsaw, Poland, American Institute of Physics, Appl. Phys. Lett., vol. 69, No. 1, pp. 73-75, Jul. 1996.
H. Morkoc, “Comprehensive Characterization of Hydride VPE Grown GaN Layers and Templates”, Elsevier Science B.V., Department of Electrical Engineering and Physics Department, Virginia Commonwealth University, Richmond, VA, Materials Science and Engineering, Reports: A Review Journal, vol. R33, pp. 135-207, 2001.
F. Yun et al., “Electrical, Structural, and Optical Characterization of Free-Standing GaN Template Grown by Hydride Vapor Phase Epitaxy”, Elsevier Science Ltd., Department of Electrical Engineering and Department of Physics, Virginia Commonwealth University, Richmond, VA, Pergamon, Solid-State Electronics, vol. 44, pp. 2225-2232, 2000.
J. A. Freitas, Jr., et al., “Structural and Optical Properties of Thick Freestanding GaN Templates”, Elsevier Science B.V., Journal of Crystal Growth, vol. 231, pp. 322-328, 2001.
Sung S. Park et al., “Free-Standing GaN Substrates by Hydride Vapor Phase Epitaxy”, Japan Journal of Applied Physics, vol. 39, Part 2, No. 11B, pp. L1141-L1142, Nov. 15, 2000.
S. K. Mathis et al., “Modeling of Threading Dislocation Reduction in Growing GaN Layers”, Phys. Stat. Sol. vol. (a) 179, pp. 125-145, 2000.
Yoshinobu Ono et al

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Gallium nitride crystals and wafers and method of making does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gallium nitride crystals and wafers and method of making, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gallium nitride crystals and wafers and method of making will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3544342

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.