Gain-stable NPN heterojunction bipolar transistor

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

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257 23, 257197, 257198, H01L 2972, H01L 29205

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053650778

ABSTRACT:
A gain-stable npn heterojunction bipolar transistor includes a graded superlattice between its base and emitter consisting of multiple discrete periods, with each period having a layer of base material and another layer of emitter material. The thicknesses of the base material layers decrease while the thicknesses of the emitter material layers increase in discrete steps for each successive period from the base to the emitter. The thickness of each period is preferably at least about 20 Angstroms, with the superlattice including more than five periods. The superlattice is preferably doped to establish an electrical base-emitter junction at a desired location. The graded superlattice inhibits the diffusion of beryllium p dopant from the base into the emitter during transistor operation, thus stabilizing the device's gain and turn-on voltage.

REFERENCES:
patent: 5162243 (1992-11-01), Streit et al.
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Capasso et al., "Pseudo-quaternary GaInAsP semiconductors: A new Ga.sub.0.47 In.sub.0.53 As/InP graded gap superlattice and its applications to avalanche photodiodes", Applied Physics Letters, vol. 45, No. 11, 1 Dec. 1984, pp. 1193-1195.
Wada et al., "Very high speed GaInAs metal-semiconductor-metal photodiode incorporating an AlInAs/GaInAs graded superlattice", Applied Physics Letters, vol. 54, No. 1, 2 Jan. 1989, pp. 16-17.
Won et al., "Self-Aligned In.sub.0.52 Al.sub.0.48 As/In.sub.0.53 Ga.sub.0.47 As Heterojunction Bipolar Transistors with Graded Interface on Semi-Insulating InP Grown by Molecular Beam Epitaxy", IEEE Electron Device Letters, vol. 10, No. 3, Mar. 1989, pp. 138-140.
Asbeck et al., "InP-based Heterojunction Bipolar Transistors: Performance Status and Circuit Applications", Second Int'l. Conf. on Indium Phophide and Related Mateials, Apr. 23-25, 1990, pp. 2-5.
Low-Temperature Characterization of High-Current-Gain Graded-Emitter AlGaAs/GaAs Narrow-Base Heterojunction Bipolar Transistor, K. Ikossi-Anastasiou et al, IEEE Electron Device Letters 13 (1992) Aug., No. 8, New York, US.
Translation of Jpn. Pat. Appln. Kokai Publication No. 4-251934, Fujitsu Sep. 8, 1992.

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