Fused silica lens, microlithography system including a fused sil

Details Fused silica lens, microlithography system including a fused sil Fused silica lens, microlithography system including a fused sil

1997-12-05

1999-04-20

Henry, Jon

Optical: systems and elements

Having significant infrared or ultraviolet property

Lens, lens system or component

501905, 501 54, 65 174, G02B 1314, C03C 306, C03C 400, C03B 1909

Patent

active

058962220

ABSTRACT:
A method of producing a fused silica glass by thermally converting a polymethylsiloxane precursor, the lens transmitting ultraviolet radiation at wavelengths below 300 nm. without undergoing a marked absorption transition, the lens so produced, and a microlithography system employing a lens of such glass.

REFERENCES:
patent: 5043002 (1991-08-01), Dobbins et al.
patent: 5616159 (1997-04-01), Araujo et al.
Publication by D. Krajnovich, I.K. Our, A.C. Tam, W. Lueng and M. Kulkarmi, "Sudden Onset of Strong Absorbtion Followed by Recovery of KrF Irraddiated Fused Silica", Optics Letters, vol. 18, No. 6, pp. 453-455, Mar. 15, 1993.

Affiliated with

Also associated with

Rating

Fused silica lens, microlithography system including a fused sil does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fused silica lens, microlithography system including a fused sil, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fused silica lens, microlithography system including a fused sil will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2251629