Fused quartz member for use in semiconductor manufacture

Details Fused quartz member for use in semiconductor manufacture Fused quartz member for use in semiconductor manufacture

1986-07-24

1990-03-27

Doll, John

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Including specific material of construction

156DIG83, 432264, C30B 1510

Patent

active

049118960

ABSTRACT:
A composite fused quartz material is disclosed for processing semiconductor grade silicon material in an improved manner. The modified vitreous material includes a disperse phase of fine size silicon metal particles which are distributed in preselected regions of the fused quartz matrix as a means of exercising temperature control in the various semiconductor processing operations using these fused quartz parts. Such utilization of the modified vitreous material in single crystal silicon rod growth and production of semiconductor grade silicon by diffusion doping is described. A method to produce the modified vitreous material is also disclosed.

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patent: 3804682 (1974-04-01), Keller
patent: 4033780 (1977-07-01), Baumgartner et al.
patent: 4042361 (1977-08-01), Bihuniak et al.
patent: 4055391 (1977-10-01), Schmidt et al.
patent: 4238274 (1980-12-01), Chu et al.
patent: 4416680 (1983-11-01), Bruning et al.
patent: 4528163 (1985-07-01), Albrecht

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