Fused .gamma.-pyrone-2-carboxylic acid derivatives and process t

Details Fused .gamma.-pyrone-2-carboxylic acid derivatives and process t Fused .gamma.-pyrone-2-carboxylic acid derivatives and process t

1977-09-08

1978-08-08

Jaisle, Cecilia M.

Drug, bio-affecting and body treating compositions

Antigen, epitope, or other immunospecific immunoeffector

Allergen or component thereof

424283, 260327TH, 2603452, 2603457R, 2603458R, A61K 3138

Patent

active

041057783

ABSTRACT:
Compounds of formula 1 ##STR1## in which R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are the same or different selected from the group consisting of hydrogen, halogen, nitro, trifluoromethyl, lower alkyl and lower alkoxy, or R.sup.1 and R.sup.2, R.sup.2 and R.sup.3, or R.sup.3 and R.sup.4 together form a CH.sub.2 CH.sub.2 CH.sub.2 CH.sub.2 chain and R.sup.3 and R.sup.4, R.sup.1 and R.sup.4 and R.sup.1 and R.sup.2, respectively, are as defined above, R.sup.5 is hydrogen, lower alkyl or a radical of formula --Alk--OR.sup.6 wherein Alk is an alkylene selected from the group consisting of CR.sup.7 R.sup.8, CR.sup.7 R.sup.8 CR.sup.9 R.sup.10, CR.sup.7 R.sup.8 CR.sup.9 R.sup.10 CR.sup.11 R.sup.12 and CR.sup.7 R.sup.8 CR.sup.9 R.sup.10 CR.sup.11 R.sup.12 CR.sup.13 R.sup.14 wherein each of R.sup.7, R.sup.8, R.sup.9, R.sup.10, R.sup.11, R.sup.12, R.sup.13 and R.sup.14 is hydrogen or lower alkyl and R.sup.6 is hydrogen or lower alkyl; R.sup.15 is hydrogen or lower alkyl; X is O, S, SO or SO.sub.2 ; Y is O or NR.sup.16 wherein R.sup.16 is hydrogen or lower alkyl, are disclosed. The compounds of formula 1 are useful for treating allergic conditions and for treating microbial infections. Methods for the preparation and use of said compounds are disclosed.

REFERENCES:
patent: 3816467 (1974-06-01), Wright
patent: 3862144 (1975-01-01), Kaminsky
Dean, et al., J. Chem. Soc., Chem. Commun., 440 (1974).

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