Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2006-12-19
2006-12-19
Young, Christopher G. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C430S302000, C430S312000, C430S328000
Reexamination Certificate
active
07150949
ABSTRACT:
The present invention relates to methods for patterning substrates, such as reticles, masks or wafers, which reduce critical dimension variations, improving CD uniformity. In particular, it relates to tuning doses applied in passes of a multipass writing strategy to measurable characteristics of resists or radiation sensitive layers applied to the substrates. Particular writing strategies are described. Aspects of the present invention are described in the claims, specification and drawings.
REFERENCES:
patent: 5774254 (1998-06-01), Berlin
patent: 6348907 (2002-02-01), Wood
patent: 2001/0040670 (2001-11-01), Fielding
Askebjer Per
Eklund Robert
Fosshaug Hans
Walford Jonathan
Beffel, Jr. Ernest J.
Haynes Beffel & Wolfeld LLP
Micronic Laser Systems AB
Young Christopher G.
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