Furnace system equipped with protected combustion nozzle used in

Details Furnace system equipped with protected combustion nozzle used in Furnace system equipped with protected combustion nozzle used in

1995-06-19

1996-12-31

Kamen, Noah P.

Heating

Work chamber having heating means

Combustion products heat work by contact

431350, F27B 300

Patent

active

055888313

ABSTRACT:
A furnace system is used for oxidizing a semiconductor wafer and diffusing a dopant impurity into the semiconductor wafer, and has a first quartz outlet gas nozzle for injecting oxygen gas, a second quartz outlet gas nozzle for injecting hydrogen so as to be burnt in the oxygen and a guard member surrounding an outlet end of the second outlet gas nozzle for spacing a high-temperature flame therefrom, thereby preventing the second quartz outlet gas nozzle from an aged deterioration due to a serious heat cycle.

REFERENCES:
patent: 3630649 (1971-12-01), Hancock et al.
patent: 5095872 (1992-03-01), Kawamura

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