Furnace for rapid thermal processing with optical switching film

Details Furnace for rapid thermal processing with optical switching film Furnace for rapid thermal processing with optical switching film

1997-12-19

2000-04-04

Jeffery, John A.

Electric resistance heating devices

Heating devices

Radiant heater

219390, 118724, 359273, G02F 302, H03K 1778

Patent

active

060471077

ABSTRACT:
A furnace (1) for Rapid Thermal Processing of a wafer (7), characterized in that the wafer (7) is heated by lamps (9), and the heat radiation is reflected by an optical switching device (15,17) which is in the reflecting state during the heating stage. During the cooling stage of the wafer (7), the heat is absorbed by the switching device (15,17), which is in the heat-absorbing state. The switching device comprises a switching film of a trivalent metal, such as gadolinium, which is capable of forming hydrides by an exchange of hydrogen. Dependent on the hydrogen concentration of the hydrides, the film reflects or absorbs heat. The hydrogen content in the switching film can be changed by varying the partial pressure of hydrogen, or, preferably, by varying the potential of the switching film forming part of a stack of layers in an electrochemical cell.

REFERENCES:
patent: 5226732 (1993-07-01), Nakos et al.
patent: 5561735 (1996-10-01), Camm
patent: 5635729 (1997-06-01), Griessen et al.
patent: 5652433 (1997-07-01), Ouwerkerk et al.

Affiliated with

Also associated with

Rating

Furnace for rapid thermal processing with optical switching film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Furnace for rapid thermal processing with optical switching film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Furnace for rapid thermal processing with optical switching film will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-372756