Functional film and method of pattern formation

Details Functional film and method of pattern formation Functional film and method of pattern formation

2007-12-04

2007-12-04

Fletcher, III, William Phillip (Department: 1762)

Coating processes

Electrical product produced

Fluorescent or phosphorescent base coating

C427S256000

Reexamination Certificate

active

11235708

ABSTRACT:
A pattern forming method for forming a functional film with a prescribed pattern on a substrate using a droplet discharge method, the pattern forming method includes: a sub region configuration process for: configuring, in a design pattern of the functional film, a plurality of sub regions which divide the designing pattern; and categorizing the plurality of sub regions into a plurality of non-adjacent groups; a first drawing process for arranging the liquid substance so as to draw a sub region that belongs to a first group categorized in the sub region configuration process; and a second drawing process for arranging the liquid substance so as to draw a sub region that belongs to a second group categorized in the sub region configuration process; wherein a solidification process for solidifying the liquid substance arranged in the first drawing process is provided between the first drawing process and the second drawing process.

REFERENCES:
patent: 5670205 (1997-09-01), Miyazaki et al.
patent: 2003-317945 (2003-11-01), None

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