Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Reexamination Certificate
2008-09-05
2011-10-18
Silverman, Stanley (Department: 1736)
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
C423S335000, C423S336000, C051S308000
Reexamination Certificate
active
08038971
ABSTRACT:
The invention provides fumed silica comprising aggregates that have an aggregate size and a surface area that satisfy particular formulas relating aggregate size to surface area, as well as aggregates that exhibit particular viscosity, power law exponent index, and/or elastic modulus characteristics when dispersed in liquid media. The invention also provides processes of preparing such fumed silica by combining a silica precursor with a stream of combustible gas, combusting the stream, and producing a stream of combusted gas and fumed silica particles, wherein dopants are introduced, the time/temperature profile, or history, of the stream of combusted gas and fumed silica particles is adjusted to allow for post-quench aggregate growth, and/or additional silica precursor is introduced into the stream of combusted gas.
REFERENCES:
patent: 2631083 (1953-03-01), Engelson et al.
patent: 2693406 (1954-11-01), Wendell, Jr. et al.
patent: 2771344 (1956-11-01), Michel et al.
patent: 2773741 (1956-12-01), Antonsen
patent: 2780525 (1957-02-01), Wendell, Jr. et al.
patent: 2801901 (1957-08-01), Dingman et al.
patent: 2803038 (1957-08-01), Holland et al.
patent: 2828186 (1958-03-01), Dingman et al.
patent: 2829949 (1958-04-01), Wendell, Jr. et al.
patent: 2847316 (1958-08-01), Michel et al.
patent: 3006738 (1961-10-01), Wagner
patent: 3007774 (1961-11-01), Stokes et al.
patent: 3024089 (1962-03-01), Spencer et al.
patent: 3065093 (1962-11-01), Berstein et al.
patent: 3112210 (1963-11-01), Carpenter et al.
patent: 3130008 (1964-04-01), Stokes et al.
patent: 3166542 (1965-01-01), Orzechowski et al.
patent: 3203762 (1965-08-01), Carpenter
patent: 3205177 (1965-09-01), Orzechowski et al.
patent: 3205178 (1965-09-01), Orzechowski et al.
patent: 3212911 (1965-10-01), Berstein et al.
patent: 3322499 (1967-05-01), Carpenter et al.
patent: 3363980 (1968-01-01), Krinov
patent: 3365274 (1968-01-01), Carpenter et al.
patent: 3372001 (1968-03-01), Wendell
patent: 3406228 (1968-10-01), Hardy et al.
patent: 3455653 (1969-07-01), Aftandilian
patent: 3488204 (1970-01-01), Jordan et al.
patent: 3493342 (1970-02-01), Weaver et al.
patent: 3510291 (1970-05-01), Brush
patent: 3510292 (1970-05-01), Hardy et al.
patent: 3607049 (1971-09-01), Weaver, Jr. et al.
patent: 3619140 (1971-11-01), Morgan et al.
patent: 3639100 (1972-02-01), Rick
patent: 3663283 (1972-05-01), Hebert et al.
patent: 3922335 (1975-11-01), Jordan et al.
patent: RE28974 (1976-09-01), Morgan et al.
patent: 4023961 (1977-05-01), Douglas et al.
patent: 4145403 (1979-03-01), Fey et al.
patent: 4822410 (1989-04-01), Matovich
patent: 4857076 (1989-08-01), Pearson et al.
patent: 4879104 (1989-11-01), List et al.
patent: 4937062 (1990-06-01), Jordan et al.
patent: 5075090 (1991-12-01), Lewis et al.
patent: 5147630 (1992-09-01), Reznek et al.
patent: 5152819 (1992-10-01), Blackwell et al.
patent: 5256389 (1993-10-01), Jordan et al.
patent: 5340560 (1994-08-01), Rohr et al.
patent: 5447708 (1995-09-01), Helble et al.
patent: 5456750 (1995-10-01), Mackay et al.
patent: 5599511 (1997-02-01), Helble et al.
patent: 5614472 (1997-03-01), Riddle et al.
patent: 5698177 (1997-12-01), Pratsinis et al.
patent: 5876683 (1999-03-01), Glumac et al.
patent: 5904762 (1999-05-01), Mahmud et al.
patent: 5958361 (1999-09-01), Laine et al.
patent: 6086841 (2000-07-01), Lee
patent: 6110437 (2000-08-01), Schall et al.
patent: 6312656 (2001-11-01), Blackwell et al.
patent: 6364944 (2002-04-01), Mahmud et al.
patent: 6551567 (2003-04-01), Konya et al.
patent: 6565823 (2003-05-01), Hawtof et al.
patent: 6602820 (2003-08-01), Göbel et al.
patent: 6613300 (2003-09-01), Mangold et al.
patent: 6627173 (2003-09-01), Hemme et al.
patent: 6630084 (2003-10-01), Oda
patent: 6767377 (2004-07-01), Schumacher et al.
patent: 6887566 (2005-05-01), Hung et al.
patent: 7083769 (2006-08-01), Moerters et al.
patent: 7351388 (2008-04-01), Schumacher et al.
patent: 2002/0041963 (2002-04-01), Konya et al.
patent: 2003/0029194 (2003-02-01), Mangold et al.
patent: 2004/0156773 (2004-08-01), Kutsovsky
patent: 2005/0238560 (2005-10-01), Kutsovsky
patent: 2006/0153764 (2006-07-01), Schumacher et al.
patent: 2006/0154994 (2006-07-01), Schumacher et al.
patent: 2006/0155042 (2006-07-01), Schumacher et al.
patent: 2006/0155052 (2006-07-01), Schumacher et al.
patent: 2007/0253884 (2007-11-01), Liu et al.
patent: 2009/0131517 (2009-05-01), Height et al.
patent: 199 55 456 (2001-05-01), None
patent: 0 471 139 (1992-02-01), None
patent: 59-223217 (1984-12-01), None
patent: WO 90/10596 (1990-09-01), None
patent: WO 90/15019 (1990-12-01), None
patent: WO 98-09753 (1998-03-01), None
patent: WO 98/09753 (1998-03-01), None
patent: WO 2004-048261 (2004-06-01), None
patent: WO 2004/056461 (2004-07-01), None
patent: WO 2004/085311 (2004-10-01), None
patent: WO 2006/084390 (2006-08-01), None
Khan, et al. “Dynamic rheological behavior of flocculated fumed silica suspensions,” J. Rheol. 37(6) (1993), pp. 1225-1235.
Barthel, et al. “Particle Sizes of Fumed Silica,” Chem. Eng. Technol. 21 (1998) 9, pp. 745-752.
HDK®, as accessed on [http://www.wacker.com/cms/media/publications/downloads/6174—EN.pdf] on Feb. 9, 2011.
Briesen et al.,Chemical Engineering Science, 53(24): 4105-4112 (Dec. 1998).
Briesen et al.,World Congress on Particle Technology, 3: 1-6 (Jul. 6-9, 1998).
Brunauer et al.,The Journal of the American Chemical Society, LX: 309-319 (Feb. 1938).
Davidson et al.,Journal of the Chemical Society, Faraday Transaction l, 71: 2260-2265 (1975).
Davidson et al.,Journal of the Chemical Society, Faraday Transaction I, 72: 1088-1095 (1976).
Donnet et al.Carbon Black Science and Technology(Donnett et al.eds), 16-18 (Marcel Dekker, Inc., New York, NY 1993).
Glassman,Combustion(Glassman ed.), 15-27 (Academic Press, Orlando, FL. 1987).
Glumac,Combustion and Flame; The Journal of the Combustion Institute, 125: 702-711 (Mar. 2001).
Guth,The Physical Review, 53(2): 322 (1938).
Hasegawa et al.,Journal of Materials Science Letters, 15(18): 1608-1611 (1996).
Hshieh,Fire and Materials, An International Journal, 23(2): 79-89 (Mar.-Apr. 1999).
Hung et al.,Journal of Materials Research, 7(7): 1861-1869 (Jul. 1992).
Ingebo et al.,National Advisory Committee for Aeronautics Technical Note4087: 1-36 (Oct. 1957).
Kammler et al.,Journal of Nanoparticle Research, 1: 467-477 (1999).
Kammler et al.,Chem. Eng. Technol. 24(6): 583-596 (2001).
Kammler et al.,AICHE Journal, 47(7): 1533-1543 (Jul. 2001).
Kodas et al.,Aerosol Processing of Materials(Kodas et al., eds), 28-31, 280-291, 302-311 (Wiley-VCH, New York, NY, 1999).
Kroschwitz,Kirk-Othmer Encyclopedia of Chemical Technology, 4thed. (Kroschwitz exec.ed.), 22: 1026-1027 (John Wiley & Sons, New York, NY, 1997).
Mädler et al.,Journal of Aerosol Science, 33: 369-389 (2002).
Mädler,KONA, 22: 107-120 (2004).
Sano et al.,Proceedings of the 7thInternational Conference on Liquid Atomization and Spray Systems, Aug. 18-22, 1997, Seoul, Korea, 97(2): 1045-1052.
Sanogo et al.,The Journal of the Electrochemical Society, 144(8): 2919-2923 (Aug. 1997).
Seto et al.,Aerosol Science and Technology, 27: 422-438 (Sep. 3, 1997).
Suzuki et al.,Journal of Materials Science, 27(3): 679-684 (Feb. 1, 1992).
Vallet-Regi et al.,Materials Science Forum, 235-238: 291-296.
Weiss et al.,ARS Journal, 29(4): 252-259 (Apr. 1959).
European Patent Office, International Search Report in International Patent Application No. PCT/US2009/056064 (Jul. 5, 2010).
European Patent Office, International Preliminary Examination Report in International Patent Application No. PCT/US2009/056064 (Mar. 8, 2011).
Davis Sheldon B.
Kutsovsky Yakov E.
Matheu David M.
Sanchez Garcia Angelica M.
Cabot Corporation
Liao Diana J
Silverman Stanley
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