Fullerenes to increase radiation resistance in polymer-based...

Details Fullerenes to increase radiation resistance in polymer-based... Fullerenes to increase radiation resistance in polymer-based...

2007-10-30

2007-10-30

Wu, David W. (Department: 1713)

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C205S782500, C428S421000, C524S495000

Reexamination Certificate

active

10403963

ABSTRACT:
A pellicle made of a polymer material contains fullerenes within the polymer material to reduce the damaging effects of radiation that is transmitted through the pellicle during an exposure operation. The fullerenes may comprise nanotubes and/or buckyballs. The buckyballs may also enclose molecules of a gas that further reduce the damaging effects of the radiation on the polymer material.

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Florence Eschbach, et al., Development of Polymer Membranes for 157 nm Lithography, Intel Corporation; Asahi Glass Company, LTD, Jan. 23, 2004, 14 pgs.
A. Tregub, et al., Development of Fluoropolymer Membranes Transparent and Resistant to 157 nm Exposure, 157 Symposium, Intel Corporation, Aug. 27, 2003, 34 pgs.

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