Frequency-stabilized line-narrowed excimer laser source system f

Details Frequency-stabilized line-narrowed excimer laser source system f Frequency-stabilized line-narrowed excimer laser source system f

1988-11-28

1989-11-14

Scott, Jr., Leon

Coherent light generators

Particular beam control device

Optical output stabilization

372 57, 372 18, H01S 313

Patent

active

048812315

ABSTRACT:
An excimer laser source system that produce radiation characterized by a wavelength with a high degree of stability and by a narrow spectral bandwidth is described. Such an excimer laser system is suitable as a source in high-resolution high-throughput lithography. Key features of the disclosed system are: frequency-locking of the excimer laser center wavelength to the cavity spacing of a highly stable external Fabry-Perot or other resonator; stabilization of the external resonator by referencing its cavity spacing to a frequency-locked reference laser; stabilization of the reference laser by locking its frequency to a fundamental atomic or molecular transistion; and provision of an intra-cavity or other Fabry-Perot resonator in the excimer laser optical cavity to both narrow the spectral bandwidth of the laser and to select its center wavelength. The advantage of the invention is its ability to transfer with precision the high degree of stability of the reference laser wavelength to the excimer laser wavelength, thereby giving the excimer laser wavelength precision and stability available only with fundamental atomic and molecular transistions.

REFERENCES:
patent: 4221472 (1980-09-01), Smith et al.
patent: 4594003 (1986-06-01), Sommargren

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