Free-radical retrograde precipitation-polymerization process

Details Free-radical retrograde precipitation-polymerization process Free-radical retrograde precipitation-polymerization process

1990-03-09

1992-12-22

Teskin, Fred

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

526 77, 526209, 5262181, 526219, 5262196, 526227, 526328, 5263292, 5263297, 526346, 526347, 526912, C08F 214, C08F 1208

Patent

active

051735512

ABSTRACT:
A free-radical retrograde polymerization process for forming a polymer. An admixture of reactants including predetermined amounts of a monomer, a solvent, and a free-radical-initiator is reacted. A precipitation polymerization reaction occurs such that a polymer-rich phase is at a temperature generally above the lower critical solution temperature (LCST) of the admixture.

REFERENCES:
patent: 2520338 (1950-08-01), Robertson
patent: 2979492 (1961-04-01), Governale et al.
patent: 3932371 (1976-01-01), Powers
patent: 3954722 (1976-05-01), Echte et al.
patent: 3956251 (1976-05-01), Feiler et al.
patent: 3965083 (1976-06-01), Jezl et al.
patent: 4076921 (1978-02-01), Stol et al.
patent: 4129701 (1978-12-01), Jezl et al.
patent: 4267103 (1981-05-01), Cohen
patent: 4319021 (1982-03-01), Irani et al.
patent: 4444922 (1984-04-01), Gutowski et al.
patent: 4528337 (1985-07-01), Kreilein et al.
"Intermettency in Nonisothermal CSTR", by G. R. Caneba, Barbara Densch AlChE Journal, Feb. 1988, vol. 34, No. 2.

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