Liquid purification or separation – Processes – Utilizing electrical or wave energy directly applied to...
Reexamination Certificate
2006-05-23
2006-05-23
Walker, W. L. (Department: 1723)
Liquid purification or separation
Processes
Utilizing electrical or wave energy directly applied to...
C210S695000, C210S758000, C210S222000, C210S223000, C210S263000, C210S290000, C210S660000, C210S694000, C422S022000, C422S186000, C422S186010, C422S186040, C250S43200R, C250S435000
Reexamination Certificate
active
07048862
ABSTRACT:
A free radical solution producing apparatus, which comprises: a feed port (6) in which water is drawn, a dechlorination processing section (1) which produces first water by decomposing chlorine compounds in said water, a magnetic processing section (2) which produces second water by carrying out a process that applies a magnetic field to said first water, a radiation processing section (3) which produces third water by carrying out a process that irradiates a radiation to said second water, an ion exchange section (4) which produces fourth water by carrying out a process that performs an ion exchange for said third water, an electric field applying section (5) which produces fifth water by carrying out a process that applies a strong electric field to said fourth water, and a fifth water intake (7-5) from which said fifth water is obtained, produces water which has the effects of sterilizing and disinfection, and strong cleansing power.
REFERENCES:
patent: 5055189 (1991-10-01), Ito
patent: 5466425 (1995-11-01), Adams
patent: 6193878 (2001-02-01), Morse et al.
patent: 6555011 (2003-04-01), Tribelsky et al.
patent: 63-4893 (1988-01-01), None
patent: 02-115094 (1990-04-01), None
patent: 04-4090 (1992-01-01), None
patent: 09-253632 (1997-09-01), None
patent: 09-308888 (1997-12-01), None
patent: 10-28974 (1998-02-01), None
patent: 10-85747 (1998-04-01), None
patent: 10-99864 (1998-04-01), None
patent: 10-174980 (1998-06-01), None
patent: 10-230265 (1998-09-01), None
patent: 11-192479 (1999-07-01), None
patent: 2000-574 (2000-01-01), None
patent: 2000-5765 (2000-01-01), None
Fukui Kenji
Kamiya Hiroaki
Menon Krishnan S.
Walker W. L.
Waterware Inc.
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