Frame-supported pellicle for protection of photolithographic mas

Details Frame-supported pellicle for protection of photolithographic mas Frame-supported pellicle for protection of photolithographic mas

1993-01-22

1994-12-06

Rosasco, Steve

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, 428422, G03F 900

Patent

active

053709519

ABSTRACT:
An improvement is proposed in a frame-supported pellicle, i.e. a thin transparent film of a polymeric resin adhesively bonded to a frame member, used for dust-proof protection of a photomask in a photolithographic patterning work for the manufacture of electronic devices. The improvement comprises using, as the adhesive, an organopolysiloxane-based composition which comprises (a) a perfluoroalkyl-containing diorganopolysiloxane having at least two vinyl groups per molecule, (b) an organohydrogenpolysiloxane having at least one epoxy group and (c) a platinum catalyst for promoting the hydrosilation reaction between (a) and (b). As compared with conventional adhesives, a quite good adhesive bonding strength can be obtained with this adhesive even when the membrane is made from a fluorocarbon group-containing polymeric resin and the adhesive layer obtained therefrom is highly resistant against ultraviolet irradiation to ensure a long serviceable life of the pellicle.

REFERENCES:
patent: 4087585 (1978-05-01), Schulz
patent: 4657805 (1987-04-01), Fukumitsu et al.
patent: 5073422 (1991-12-01), Konno et al.
patent: 5120810 (1992-06-01), Fujiki et al.
patent: 5168001 (1992-12-01), Legare et al.

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