Frame-supported pellicle for photolithography

Details Frame-supported pellicle for photolithography Frame-supported pellicle for photolithography

1995-09-07

1997-01-28

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

428 14, 428421, 428422, G03F 900

Patent

active

055976697

ABSTRACT:
Proposed is a frame-supported pellicle for dustproof protection of a photomask in the photolithographic patterning work for the manufacture of fine electronic devices having excellent mechanical properties and durability of the pellicle membrane against air blow and ultraviolet irradiation. The advantages of the inventive frame-supported pellicle is obtained by the use of, in place of conventional cellulose-based polymers and fluorocarbon-based resins, a norbornene-based plastic resin as the material of the pellicle membrane spread over and adhesively bonded to one end surface of a rigid frame in a slack-free fashion.

REFERENCES:
patent: 5370951 (1993-01-01), Kubota et al.
patent: 5378514 (1993-08-01), Hamada et al.

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