Frame-supported dustproof pellicle for photolithographic photoma

Details Frame-supported dustproof pellicle for photolithographic photoma Frame-supported dustproof pellicle for photolithographic photoma

1996-11-21

1998-11-10

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

428 14, G03F 900

Patent

active

058341439

ABSTRACT:
Proposed is a frame-supported pellicle used for dustproof protection of a photomask in the photolithographic patterning work for the manufacture of electronic fine devices such as LSIs, VLSIs and the like by mounting thereon. The inventive frame-supported pellicle is characterized in that the pellicle frame, to which a pellicle membrane is adhesively bonded on one of the end surfaces, is partly subjected to smoothing treatment. The inventive frame-supported pellicle can solve the heretofore unavoidable problems of dust particle deposition on the photomask even under dustproof protection with a pellicle as well as the high cost of the preparation of the pellicle and the difficulty of finding of any dust particles deposited on the surface of the frame.

REFERENCES:
patent: 4861403 (1989-08-01), Yoshimi et al.
patent: 5419972 (1995-05-01), Kawaguchi et al.
patent: 5470621 (1995-11-01), Kashida et al.

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