Frame structure for turbulence control in immersion lithography

Details Frame structure for turbulence control in immersion lithography Frame structure for turbulence control in immersion lithography

2007-10-30

2007-10-30

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

11000654

ABSTRACT:
Disclosed are systems and methods that employ a structural framework of cell gratings placed on a wafer surface during an immersion lithography process to restrict motion of the immersion fluid. Thus, when the stepper lens comes in contact with the immersion fluid, a typically stable immersion fluid dynamics can be maintained with the cells during the immersion lithography process. In addition, various monitoring and control systems are employed to regulate stability of the immersion fluid.

REFERENCES:
patent: 5610683 (1997-03-01), Takahashi
patent: 6844206 (2005-01-01), Phan et al.
patent: 6867844 (2005-03-01), Vogel et al.
patent: 7006209 (2006-02-01), Levinson
patent: 2004/0227923 (2004-11-01), Flagello et al.
patent: 2005/0175776 (2005-08-01), Streefkerk et al.

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