FRAM capacitor stack clean

Details FRAM capacitor stack clean FRAM capacitor stack clean

2007-06-12

2007-06-12

Carrillo, Sharidan (Department: 1746)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S001100, C134S002000, C134S003000, C134S026000, C134S027000, C134S028000, C134S029000, C134S034000, C134S036000, C134S041000, C134S902000

Reexamination Certificate

active

10447581

ABSTRACT:
An embodiment of the invention is a method of cleaning a material stack2that has a hard mask top layer8. The method involves cleaning the material stack2with a fluorine-based plasma etch. The method further involves rinsing the material stack2with a wet clean process.

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