Wells – Processes – Placing fluid into the formation
Reexamination Certificate
2005-08-16
2005-08-16
Tsay, Frank (Department: 3672)
Wells
Processes
Placing fluid into the formation
C166S311000
Reexamination Certificate
active
06929069
ABSTRACT:
Improved aqueous fracturing fluids are disclosed that are particularly useful as well stimulation fluids to fracture tight (i.e., low permeability) subterranean formations. Gas wells treated with these fracturing fluids have rapid cleanup and enhanced well production. The fluids contain small but sufficient amounts of certain amine oxides to aid in the removal of the fracturing fluid from the formation. By facilitating the removal of fluid from the invaded zones, the amount of damage to the fracture faces in the formation is thereby minimized. The amine oxides correspond to the formula I, wherein R1is an aliphatic group of from 6 to about 20 carbon atoms, and wherein R2and R3are each independently alkyl of from 1 to about 4 carbon atoms. The amine oxides in which R1is an alkyl group are preferred, and those in which R1is an alkyl group of from 8 to 10 carbon atoms and R2and R3are each methyl or ethyl groups are most preferred.
REFERENCES:
patent: 4113631 (1978-09-01), Thompson
patent: 5551516 (1996-09-01), Norman et al.
patent: 5979555 (1999-11-01), Gadberry et al.
patent: 6035936 (2000-03-01), Whalen
patent: 6302209 (2001-10-01), Thompson et al.
patent: 2003/0040546 (2003-02-01), Dahayanake et al.
patent: 2003/0092581 (2003-05-01), Crews
patent: 2354541 (2001-03-01), None
patent: 2383809 (2003-07-01), None
Boney Curtis
Brown J. Ernest
Hinkel Jerald
Sutton Gregory
Cate David
Curington Tim
Mitchell Thomas O.
Schlumberger Technology Corporation
Tsay Frank
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