Fractionation of phenol formaldehyde condensate and photoresist

Details Fractionation of phenol formaldehyde condensate and photoresist Fractionation of phenol formaldehyde condensate and photoresist

1995-09-20

1997-12-02

Chu, John S.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Treating polymer containing material or treating a solid...

528129, 528501, 430168, 430169, 4302701, 210661, 210681, 210683, C08J 300, G03C 7022

Patent

active

056937490

ABSTRACT:
A process for producing a water insoluble, aqueous alkali soluble, film forming novolak resin fraction having a low metal ion content, made by the fractionation of a phenol formaldehyde condensation product, a process for producing a photoresist compositions containing such a novolak resin, and a method for producing a semiconductor device using such a photoresist composition.

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Chemistry & Application of Phenolic Resins, A. Knap & W. Scheib, Springer Verlag, New York, 1979, Chapter 4.
Light Sensitive Systems, J. Kosar, John Wiley & Sons, New York, 1965, Chapter 7.4.

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