Fractionation of phenol formaldehyde condensate and photoresist

Details Fractionation of phenol formaldehyde condensate and photoresist Fractionation of phenol formaldehyde condensate and photoresist

1995-09-20

1998-04-14

Chu, John S.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Treating polymer containing material or treating a solid...

528129, 528501, 430168, 430169, 4302701, 210683, 210685, C08J 300, G03C 7022

Patent

active

057392650

ABSTRACT:
A process for producing a water insoluble, aqueous alkali soluble, film forming novolak resin having low metal ions, made by the fractionation of a phenol formaldehyde condensation product, a process for producing a resin a photoresist composition of superior quality containing such novolak resin, and a method for producing a semiconductor device using such photoresist composition.

REFERENCES:
patent: 3106465 (1963-10-01), Neugebauer et al.
patent: 4033909 (1977-07-01), Papa
patent: 4719167 (1988-01-01), Miura et al.
patent: 5378802 (1995-01-01), Honda
patent: 5521052 (1996-05-01), Rahman et al.
Chemistry & Application of Phenolic Resins, A. Knap & W. Scheib, Springer Verlag, New York, 1979, Chapter 4.
Light Sensitive Systems, J. Kosar, John Wiley & Sons, New York, 1965, Chapter 7.4.

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