Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2008-03-18
2008-03-18
Lauchman, Layla G. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C256S013000, C256S013000, C359S559000
Reexamination Certificate
active
11228584
ABSTRACT:
Fourier filters and wafer inspection systems are provided. One embodiment relates to a one-dimensional Fourier filter configured to be included in a bright field inspection system such that the bright field inspection system can be used for broadband dark field inspection of a wafer. The Fourier filter includes an asymmetric illumination aperture configured to be positioned in an illumination path of the inspection system. The Fourier filter also includes an asymmetric imaging aperture complementary to the illumination aperture. The imaging aperture is configured to be positioned in a light collection path of the inspection system such that the imaging aperture blocks light reflected and diffracted from structures on the wafer and allows light scattered from defects on the wafer to pass through the imaging aperture.
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Hill Andrew V.
Ray-Chaudhuri Avijit K.
Vaez-Iravani Mehdi
Zhao Guoheng
Baker & McKenzie LLP
KLA-Tencor Technologies Corp.
Lauchman Layla G.
Underwood Jarreas
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