Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2008-03-18
2008-03-18
Lauchman, Layla G. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C256S013000, C256S013000, C359S559000
Reexamination Certificate
active
07345754
ABSTRACT:
Fourier filters and wafer inspection systems are provided. One embodiment relates to a one-dimensional Fourier filter configured to be included in a bright field inspection system such that the bright field inspection system can be used for broadband dark field inspection of a wafer. The Fourier filter includes an asymmetric illumination aperture configured to be positioned in an illumination path of the inspection system. The Fourier filter also includes an asymmetric imaging aperture complementary to the illumination aperture. The imaging aperture is configured to be positioned in a light collection path of the inspection system such that the imaging aperture blocks light reflected and diffracted from structures on the wafer and allows light scattered from defects on the wafer to pass through the imaging aperture.
REFERENCES:
patent: 3257563 (1966-06-01), Laurent
patent: 4330775 (1982-05-01), Iwamoto et al.
patent: 4871257 (1989-10-01), Suzuki et al.
patent: 5098191 (1992-03-01), Noguchi et al.
patent: 5264912 (1993-11-01), Vaught et al.
patent: 5276498 (1994-01-01), Galbraith et al.
patent: 5440426 (1995-08-01), Sandstrom
patent: 5629768 (1997-05-01), Hagiwara
patent: 5742422 (1998-04-01), Drake
patent: 5798831 (1998-08-01), Hagiwara
patent: 5863712 (1999-01-01), Von Bunau et al.
patent: 5970168 (1999-10-01), Montesanto et al.
patent: 6009222 (1999-12-01), Dong et al.
patent: 6020957 (2000-02-01), Rosengaus
patent: 6100971 (2000-08-01), Imaino et al.
patent: 6538730 (2003-03-01), Vaez-Iravani et al.
patent: 6608676 (2003-08-01), Zhao et al.
patent: 6624880 (2003-09-01), Sandstrom et al.
patent: 6686602 (2004-02-01), Some
patent: 6724473 (2004-04-01), Leong et al.
patent: 6809808 (2004-10-01), Feldman et al.
patent: 6853475 (2005-02-01), Feldman et al.
patent: 6856931 (2005-02-01), Yoshida
patent: 6870949 (2005-03-01), Baldwin
patent: 6882417 (2005-04-01), Goldberg et al.
patent: 6908197 (2005-06-01), Penn
patent: 6947199 (2005-09-01), Roxlo et al.
patent: 2002/0186944 (2002-12-01), Riant et al.
patent: 2003/0117616 (2003-06-01), Nakamura
patent: 2004/0042001 (2004-03-01), Vaez-Iravani et al.
patent: 2004/0125368 (2004-07-01), Vaez-Iravani
patent: 2004/0235208 (2004-11-01), Reinhorn
patent: 1-217243 (1989-08-01), None
patent: 4-204145 (1992-07-01), None
patent: 11-190698 (1999-07-01), None
Hill Andrew V.
Ray-Chaudhuri Avijit K.
Vaez-Iravani Mehdi
Zhao Guoheng
Baker & McKenzie LLP
KLA-Tencor Technologies Corp.
Lauchman Layla G.
Underwood Jarreas
LandOfFree
Fourier filters and wafer inspection systems does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Fourier filters and wafer inspection systems, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fourier filters and wafer inspection systems will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2791827