Fourier filtering mechanism for inspecting wafers

Details Fourier filtering mechanism for inspecting wafers Fourier filtering mechanism for inspecting wafers

1997-08-05

1999-10-19

Kelley, Christopher S.

Image analysis

Applications

Manufacturing or product inspection

382210, 250347, 25039009, 378145, 378154, 378155, G06K 900

Patent

active

059701684

ABSTRACT:
The present invention resides in a Fourier filter to detect defects on semiconductor wafers. The present invention relates to a Fourier filter to detect defects on semiconductor wafers which is less susceptible to having the filter output affected by vibrations and which avoids the physical contact from conventional damping.

REFERENCES:
patent: 3620598 (1971-11-01), Gerald
patent: 4340818 (1982-07-01), Barnes
patent: 4465371 (1984-08-01), Pernick
patent: 4648041 (1987-03-01), Tarr
patent: 5274434 (1993-12-01), Morioka et al.
patent: 5276498 (1994-01-01), Galbraith et al.
patent: 5425816 (1995-06-01), Cavicchi et al.
patent: 5463459 (1995-10-01), Morioka et al.
patent: 5806181 (1998-09-01), Khandros et al.

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