Fortified, compensated and uncompensated process-sensitive...

Details Fortified, compensated and uncompensated process-sensitive... Fortified, compensated and uncompensated process-sensitive...

2007-09-04

2007-09-04

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

Dimension

C356S601000, C250S23700G, C250S559190, C257S048000

Reexamination Certificate

active

10605751

ABSTRACT:
A scatterometry target is provided in which a plurality of parallel elongated features are placed, each having a length in a lengthwise direction. A plurality of stress-relief features are disposed at a plurality of positions along the length of each elongated feature.

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