Semiconductor device manufacturing: process – Having magnetic or ferroelectric component
Reexamination Certificate
2002-05-31
2010-06-01
Tsai, H. Jey (Department: 2895)
Semiconductor device manufacturing: process
Having magnetic or ferroelectric component
C438S240000, C438S238000, C438S250000, C438S393000, C257SE27104
Reexamination Certificate
active
07727777
ABSTRACT:
In accordance with some embodiments, a ferroelectric polymer memory may be formed of a plurality of stacked layers. Each layer may be separated from the ensuing layer by a polyimide layer. The polyimide layer may provide reduced layer-to-layer coupling, and may improve planarization after the lower layer fabrication.
REFERENCES:
patent: 4939568 (1990-07-01), Kato et al.
patent: 5277757 (1994-01-01), Sato
patent: 5843516 (1998-12-01), Derbenwick et al.
patent: 6055180 (2000-04-01), Gudesen et al.
patent: 6232212 (2001-05-01), Degani et al.
patent: 6344400 (2002-02-01), Yutani
patent: 6420190 (2002-07-01), Shimoda et al.
patent: 6429089 (2002-08-01), Matsuki
patent: 6436838 (2002-08-01), Ying et al.
patent: 6541869 (2003-04-01), Gudesen et al.
patent: 6593058 (2003-07-01), Feiring et al.
patent: 6798003 (2004-09-01), Li et al.
patent: 2002/0008079 (2002-01-01), Chung
patent: 2002/0036934 (2002-03-01), Hasegawa et al.
patent: 2002/0044480 (2002-04-01), Gudesen et al.
patent: 2003/0017627 (2003-01-01), Li et al.
patent: 2003/0076649 (2003-04-01), Speakman
patent: 2003/0218896 (2003-11-01), Pon et al.
patent: 63-293729 (1988-11-01), None
patent: 63293729 (1988-11-01), None
patent: 10-22470 (1998-01-01), None
patent: 10-022470 (1998-01-01), None
patent: 10022470 (1998-01-01), None
1989-018689, an english abstract of Jp 63-293729, ferroelectric polymer memory by Derwent Information Ltd, 1989.
JP410022470-A, an english abstract, 1998.
Andideh Ebrahim
Isenberger Mark
Leeson Michael
Rahnama Mani
Trop Pruner & Hu P.C.
Tsai H. Jey
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