Forming electroplated inductor structures for integrated...

Details Forming electroplated inductor structures for integrated... Forming electroplated inductor structures for integrated...

2007-12-31

2011-10-04

Austin, Aaron (Department: 1784)

Stock material or miscellaneous articles

Composite

Of inorganic material

C428S692100, C428S655000, C428S336000, C428S704000, C428S928000, C428S611000, C428S635000, C428S668000, C336S08400R, C336S177000

Reexamination Certificate

active

08029922

ABSTRACT:
Methods and associated structures of forming microelectronic devices are described. Those methods may include forming a magnetic material on a substrate, wherein the magnetic material comprises rhenium, cobalt, iron and phosphorus, and annealing the magnetic material at a temperature below about 330 degrees Celsius, wherein the coercivity of the annealed magnetic material is below about 1 Oersted.

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patent: 60025203 (1985-02-01), None

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