Forming a plurality of thin-film devices

Semiconductor device manufacturing: process – Making point contact device

Reexamination Certificate

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C438S946000, C148SDIG016

Reexamination Certificate

active

10895584

ABSTRACT:
An aspect of the present invention is a method for forming a plurality of thin-film devices. The method includes coarsely patterning at least one thin-film material on a flexible substrate and forming a plurality of thin-film elements on the flexible substrate with a self-aligned imprint lithography (SAIL) process.

REFERENCES:
patent: 6586327 (2003-07-01), Shepard
patent: 6599796 (2003-07-01), Mei et al.
patent: 6646912 (2003-11-01), Hurst et al.
patent: 6861365 (2005-03-01), Taussig et al.
patent: 2002/0132482 (2002-09-01), Chou
patent: 2005/0170639 (2005-08-01), Mei
patent: 2005/0176182 (2005-08-01), Me et al.

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