Semiconductor device manufacturing: process – Making point contact device
Reexamination Certificate
2007-03-27
2007-03-27
Dang, Trung (Department: 2823)
Semiconductor device manufacturing: process
Making point contact device
C438S946000, C148SDIG016
Reexamination Certificate
active
10895584
ABSTRACT:
An aspect of the present invention is a method for forming a plurality of thin-film devices. The method includes coarsely patterning at least one thin-film material on a flexible substrate and forming a plurality of thin-film elements on the flexible substrate with a self-aligned imprint lithography (SAIL) process.
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patent: 2005/0170639 (2005-08-01), Mei
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