Forming a piezoelectric layer with improved texture

Details Forming a piezoelectric layer with improved texture Forming a piezoelectric layer with improved texture

1997-10-09

1999-09-14

Beck, Shrive

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of coating supply or source outside of primary...

427100, 427564, 427576, 4272552, C23C 1634

Patent

active

059520590

ABSTRACT:
A method is provided for forming a piezoelectric layer with improved texture. In the method, a metallic material is evaporated. A noble gas is combined with a reactant gas. An atomic reactant gas flow is generated from the combined gas using a plasma source. The atomic reactant gas flow is introduced to the evaporated metallic material in the presence of a substrate under molecular flow pressure conditions to form a piezoelectric layer with improved texture on the surface of the substrate.

REFERENCES:
patent: 3655429 (1972-04-01), Deklerk
Wauk et al., Applied Physics Letters, vol. 13, No. 8, pp. 286-288, Oct. 1968.

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