Forming a dielectric layer using a hydrocarbon-containing...

Details Forming a dielectric layer using a hydrocarbon-containing... Forming a dielectric layer using a hydrocarbon-containing...

2006-11-21

2006-11-21

Meeks, Timothy (Department: 1762)

Coating processes

Nonuniform coating

Deforming the base or coating or removing a portion of the...

C427S248100, C427S256000, C427S255280, C427S249150, C427S255230

Reexamination Certificate

active

07138158

ABSTRACT:
In one embodiment, the present invention includes introducing a precursor containing hydrocarbon substituents and optionally a second conventional or hydrocarbon-containing precursor into a vapor deposition apparatus; and forming a dielectric layer having the hydrocarbon substituents on a substrate within the vapor deposition apparatus from the precursor(s). In certain embodiments, at least a portion of the hydrocarbon substituents may be later removed from the dielectric layer to reduce density thereof.

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