Coating apparatus – Gas or vapor deposition – Running length work
Patent
1994-11-22
1996-01-30
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Running length work
118719, 118729, C23C 1600
Patent
active
054877849
ABSTRACT:
Apparatus and method for forming a metal oxide film on a glass substrate in which ambient air and particularly water vapor is prevented from reaching the initial nucleation site by injection of dry gas at a point such that ambient air is excluded from the area around the upstream edge of the injector where the film first starts to be formed. Crystal growth inhibiting gas is injected so as to reach only the initial nucleation site to improve the nucleation process, thereby improving film properties without decreasing the overall film thickness. Application of the above methods in the deposition of tin oxide yields improved haze control of the tin oxide film, including very low haze coatings.
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