Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent
1992-07-14
1993-08-03
Powell, William A.
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
156643, 156635, 427249, B05D 306, C23C 1600
Patent
active
052327493
ABSTRACT:
A method of forming an adherent, self-limiting film of a predetermined thickness on a substrate by irradiating the substrate material with photons having an energy greater than the material's photoemission threshold (PET), causing secondary electrons to be emitted from the substrate's surface. The emitted secondary electrons are reacted with a precursor gas to form one or more reactive intermediates, which in turn react to form a film on the substrate. The film formed is essentially transparent to the incident photon irradiation, and does not appreciably reduce the photon flux reaching the surface. The film material has a PET which is greater than that of the substrate, and therefore does not emit secondary electrons in response to the photon radiation. Additionally, the film is only partially transmissive of secondary electrons emitted from the substrate surface. As the film grows, fewer of the emitted electrons are able to escape from the surface of the film to react with the precursor gas. The film continues to grow in thickness until a thickness is reached at which no secondary electrons are able to escape to react with the precursor gas, and the film formation reaction stops. Continued irradiation of the substrate results in no further film growth since secondary electrons are not able to escape the film to react with the precursor gas.
REFERENCES:
patent: 4615904 (1986-10-01), Ehrlich et al.
patent: 5079600 (1992-01-01), Schnur et al.
patent: 5129991 (1992-07-01), Gilton
Micro)n Technology, Inc.
Powell William A.
Starkweather Michael W.
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